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| The gridless plasma eon source (GIS) for plasma ion assisted optical coating | |
| You, D. W.; Li, X. Q.; Wang, Y.; Lin, Y. C.; 北京8701信箱 | |
| Department | 其他 |
| Source Publication | Plasma Science & Technology
 |
| 2004 | |
| Volume | 6Issue:4Pages:2416-2418 |
| ISSN | 1009-0630 |
| Language | 英语 |
| Keyword | Plasma Ion Source Plasma Asisted Deposition Optical Coating |
| Abstract | High-quality optical coating is a key technology for modern optics. Ion-assisted deposition technology was used to improve the vaporized coating in 1980's. The GIS (gridless ion source), which is an advanced plasma source for producing a high-quality optical coating in large area, can produce a large area uniformity>1000 mm(diameter), a high ion current density similar to 0.5 mA/cm(2), 20 eV similar to 200 eV energetic plasma ions and can activate reactive gas and film atoms. Now we have developed a GIS system. The GIS and the plasma ion-assisted deposition technology are investigated to achieve a high-quality optical coating. The GIS is a high power and high current source with a power of 1 kW similar to 7.5 kW, a current of 10 A similar to 70 A and an ion density of 200 muA/cm(2) similar to 500 muA/cm(2). Because of the special magnetic structure, the plasma-ion extraction efficiency has been improved to obtain a maximum ion density of 500 muA/cm(2) in the medium power (similar to 4kW) level. The GIS applied is of a special cathode structure, so that the GIS operation can be maintained under a rather low power and the lifetime of cathode will be extended. The CIS has been installed in the LPSX-1200 type box coating system. The coated TiO2, SiO2 films such as antireflective films with the system have the same performance reported by Leybold Co, 1992, along with a controllable refractive index and film structure. |
| Indexed By | SCI |
| Document Type | 期刊论文 |
| Identifier | http://ir.nssc.ac.cn/handle/122/1689 |
| Collection | 其他部室 |
| Corresponding Author | 北京8701信箱 |
| Recommended Citation GB/T 7714 | You, D. W.,Li, X. Q.,Wang, Y.,et al. The gridless plasma eon source (GIS) for plasma ion assisted optical coating[J]. Plasma Science & Technology,2004,6(4):2416-2418. |
| APA | You, D. W.,Li, X. Q.,Wang, Y.,Lin, Y. C.,&北京8701信箱.(2004).The gridless plasma eon source (GIS) for plasma ion assisted optical coating.Plasma Science & Technology,6(4),2416-2418. |
| MLA | You, D. W.,et al."The gridless plasma eon source (GIS) for plasma ion assisted optical coating".Plasma Science & Technology 6.4(2004):2416-2418. |
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| File Name/Size | DocType | Version | Access | License | ||
| 2004642416.pdf（217KB） | 开放获取 | CC BY-NC-SA | View Download | |||
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