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Effect of Phantom Dark Energy on Holographic Thermalization
Zeng, Xiao-Xiong; Hu, Xin-Yun; Li, Li-Fang
Department空间科学部
Source PublicationCHINESE PHYSICS LETTERS
2017
Volume34Issue:1Pages:10401
ISSN0256-307X
Language英语
AbstractHolographic thermalization for a black hole surrounded by phantom dark energy is probed. The result shows that the smaller the phantom dark energy parameter is, the easier the is plasma to thermalize as the chemical potential is fixed, the larger the chemical potential is, and the harder the plasma is to thermalize as the dark energy parameter is fixed. The thermalization velocity and thermalization acceleration are presented by fitting the thermalization curves.
Indexed BySCI ; CSCD
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Document Type期刊论文
Identifierhttp://ir.nssc.ac.cn/handle/122/5814
Collection空间科学部
Recommended Citation
GB/T 7714
Zeng, Xiao-Xiong,Hu, Xin-Yun,Li, Li-Fang. Effect of Phantom Dark Energy on Holographic Thermalization[J]. CHINESE PHYSICS LETTERS,2017,34(1):10401.
APA Zeng, Xiao-Xiong,Hu, Xin-Yun,&Li, Li-Fang.(2017).Effect of Phantom Dark Energy on Holographic Thermalization.CHINESE PHYSICS LETTERS,34(1),10401.
MLA Zeng, Xiao-Xiong,et al."Effect of Phantom Dark Energy on Holographic Thermalization".CHINESE PHYSICS LETTERS 34.1(2017):10401.
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