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题名: Effect of Phantom Dark Energy on Holographic Thermalization
作者: Zeng, Xiao-Xiong; Hu, Xin-Yun; Li, Li-Fang
作者部门: 空间科学部
刊名: CHINESE PHYSICS LETTERS
ISSN号: 0256-307X
出版日期: 2017
卷号: 34, 期号:1, 页码:10401
收录类别: SCI
项目资助者: National Natural Science Foundation of China [11405016, 11365008] ; China Postdoctoral Science Foundation [2016M590138]
英文摘要: Holographic thermalization for a black hole surrounded by phantom dark energy is probed. The result shows that the smaller the phantom dark energy parameter is, the easier the is plasma to thermalize as the chemical potential is fixed, the larger the chemical potential is, and the harder the plasma is to thermalize as the dark energy parameter is fixed. The thermalization velocity and thermalization acceleration are presented by fitting the thermalization curves.
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.nssc.ac.cn/handle/122/5814
Appears in Collections:空间科学部_期刊论文

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