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用于材料改性的宽束离子源现状及其发展
Alternative TitleSTATUS AND DEVELOPMENT OF BROAD BEAMION SOURCES FOR MATERIAL MODIFICATION
尤大纬; 冯毓材; 王宇; 北京8701信箱
Department空间科学试验技术研究室
Source Publication微细加工技术
1996
Issue1Pages:67-75
ISSN1003-8213
Language中文
Keyword离子束 材料改性 离子源 薄膜制备 离子注入
Abstract本文叙述了对材料衣面改性的宽束离子源的要求,重.点介绍了考夫曼型气体离子源及电子束落发强流金属离子源,也介绍了RF,ECR离子源及MEVVA 源。
Other AbstractThe demands on broad ion sources for material modification are described. The kaufman ion sources and the Electron beam evaporation metal ion source (EBE)of high current are emphasised. The RF,ECR,as well as MEVVA sources are also introduced.
Funding Project中国科学院空间科学与应用研究中心
Document Type期刊论文
Identifierhttp://ir.nssc.ac.cn/handle/122/598
Collection空间技术部
Corresponding Author北京8701信箱
Recommended Citation
GB/T 7714
尤大纬,冯毓材,王宇,等. 用于材料改性的宽束离子源现状及其发展[J]. 微细加工技术,1996(1):67-75.
APA 尤大纬,冯毓材,王宇,&北京8701信箱.(1996).用于材料改性的宽束离子源现状及其发展.微细加工技术(1),67-75.
MLA 尤大纬,et al."用于材料改性的宽束离子源现状及其发展".微细加工技术 .1(1996):67-75.
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