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走向工业应用的离子辅助光学镀膜技术
Alternative TitlePlasma Assisted Optical Deposition Technology For Industrial Applications
尤大伟; 李晓谦; 王怡德; 林永; 北京8701信箱
Department空间科学试验技术研究室
Source Publication微细加工技术
2003
Issue3Pages:1-5
ISSN1003-8213
Language中文
Keyword等离子体离子辅助镀膜 无栅等离子体源 光学镀膜
Abstract介绍一种新型等离子体辅助镀膜技术, 使用该技术可使高质量的光学镀膜大量 生产。该技术核心是无栅等离子体源( GIS) 。GIS 可以产生大面积的均匀等离子体, 直径大于1000mm。等离子体离子流强度高达0. 5mA/ cm2, 离子流能量20- 200eV, 并能激活反应气体O2 及蒸发原子, 用GIS 进行的等离子体离子辅助镀膜这一技术, 现正用于生产高质量的光学薄膜。
Other AbstractA new plasma assisted technoology is introduced. U sing this technique it is possible to produce optical film of high quality in volume production. T he key to the technology is the gr idless plasma source( GIS ) . GIS can produce uniform plasma in large area, more than 1mdiameter , plasma ion cur rent density is up to 0. 5mA/ cm2 and ion energy is 20~ 200eV. It can excite reactive gas O2 and vapor ized atoms. Nowadays the plasma assisted deposition technology is being used to produce high quality optical films.
Funding Project中国科学院空间科学与应用研究中心
Document Type期刊论文
Identifierhttp://ir.nssc.ac.cn/handle/122/600
Collection空间技术部
Corresponding Author北京8701信箱
Recommended Citation
GB/T 7714
尤大伟,李晓谦,王怡德,等. 走向工业应用的离子辅助光学镀膜技术[J]. 微细加工技术,2003(3):1-5.
APA 尤大伟,李晓谦,王怡德,林永,&北京8701信箱.(2003).走向工业应用的离子辅助光学镀膜技术.微细加工技术(3),1-5.
MLA 尤大伟,et al."走向工业应用的离子辅助光学镀膜技术".微细加工技术 .3(2003):1-5.
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