NSSC OpenIR  > 空间技术部
Alternative TitlePlasma Assisted Optical Deposition Technology For Industrial Applications
尤大伟; 李晓谦; 王怡德; 林永; 北京8701信箱
Source Publication微细加工技术
Keyword等离子体离子辅助镀膜 无栅等离子体源 光学镀膜
Abstract介绍一种新型等离子体辅助镀膜技术, 使用该技术可使高质量的光学镀膜大量 生产。该技术核心是无栅等离子体源( GIS) 。GIS 可以产生大面积的均匀等离子体, 直径大于1000mm。等离子体离子流强度高达0. 5mA/ cm2, 离子流能量20- 200eV, 并能激活反应气体O2 及蒸发原子, 用GIS 进行的等离子体离子辅助镀膜这一技术, 现正用于生产高质量的光学薄膜。
Other AbstractA new plasma assisted technoology is introduced. U sing this technique it is possible to produce optical film of high quality in volume production. T he key to the technology is the gr idless plasma source( GIS ) . GIS can produce uniform plasma in large area, more than 1mdiameter , plasma ion cur rent density is up to 0. 5mA/ cm2 and ion energy is 20~ 200eV. It can excite reactive gas O2 and vapor ized atoms. Nowadays the plasma assisted deposition technology is being used to produce high quality optical films.
Funding Project中国科学院空间科学与应用研究中心
Document Type期刊论文
Corresponding Author北京8701信箱
Recommended Citation
GB/T 7714
尤大伟,李晓谦,王怡德,等. 走向工业应用的离子辅助光学镀膜技术[J]. 微细加工技术,2003(3):1-5.
APA 尤大伟,李晓谦,王怡德,林永,&北京8701信箱.(2003).走向工业应用的离子辅助光学镀膜技术.微细加工技术(3),1-5.
MLA 尤大伟,et al."走向工业应用的离子辅助光学镀膜技术".微细加工技术 .3(2003):1-5.
Files in This Item: Download All
File Name/Size DocType Version Access License
200331.pdf(188KB) 开放获取CC BY-NC-SAView Download
Related Services
Recommend this item
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[尤大伟]'s Articles
[李晓谦]'s Articles
[王怡德]'s Articles
Baidu academic
Similar articles in Baidu academic
[尤大伟]'s Articles
[李晓谦]'s Articles
[王怡德]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[尤大伟]'s Articles
[李晓谦]'s Articles
[王怡德]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 200331.pdf
Format: Adobe PDF
This file does not support browsing at this time
All comments (0)
No comment.

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.