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光学镀膜用大束密均匀区离子源
Alternative TitleAn ion source with good beam current density uniformity for optical films deposition
况园珠; 郑保民; 李安杰; 北京8701信箱
Department空间科学技术研究室
Source Publication光学仪器
2001
Volume23Issue:5Pages:53-57
ISSN1005-5630
Language中文
Keyword离子源 束流密度 均匀性
Abstract介绍一个适用于光学镀膜用的直径为120mm的大束密均匀区离子源的结构设计及性能参数,并对影响束密均匀性的因素进行了讨论.
Other AbstractThis paper in t roduces the st ructu re design and perfo rmance parameters of a <120mm ion sou rce w ith good beam cu rren t un ifo rm ity fo r op t ical f ilm s depo sit ion. The facto rs effect ing the unifo rmity of beam cu rren t den sity are discu ssed.
Funding Project中国科学院空间科学与应用研究中心
Document Type期刊论文
Identifierhttp://ir.nssc.ac.cn/handle/122/612
Collection空间技术部
Corresponding Author北京8701信箱
Recommended Citation
GB/T 7714
况园珠,郑保民,李安杰,等. 光学镀膜用大束密均匀区离子源[J]. 光学仪器,2001,23(5):53-57.
APA 况园珠,郑保民,李安杰,&北京8701信箱.(2001).光学镀膜用大束密均匀区离子源.光学仪器,23(5),53-57.
MLA 况园珠,et al."光学镀膜用大束密均匀区离子源".光学仪器 23.5(2001):53-57.
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