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Alternative TitleAn ion source with good beam current density uniformity for optical films deposition
况园珠; 郑保民; 李安杰; 北京8701信箱
Source Publication光学仪器
Keyword离子源 束流密度 均匀性
Other AbstractThis paper in t roduces the st ructu re design and perfo rmance parameters of a <120mm ion sou rce w ith good beam cu rren t un ifo rm ity fo r op t ical f ilm s depo sit ion. The facto rs effect ing the unifo rmity of beam cu rren t den sity are discu ssed.
Funding Project中国科学院空间科学与应用研究中心
Document Type期刊论文
Corresponding Author北京8701信箱
Recommended Citation
GB/T 7714
况园珠,郑保民,李安杰,等. 光学镀膜用大束密均匀区离子源[J]. 光学仪器,2001,23(5):53-57.
APA 况园珠,郑保民,李安杰,&北京8701信箱.(2001).光学镀膜用大束密均匀区离子源.光学仪器,23(5),53-57.
MLA 况园珠,et al."光学镀膜用大束密均匀区离子源".光学仪器 23.5(2001):53-57.
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