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用于薄膜制备的射频宽束离子源的设计
Alternative TitleDevelopment of Broad Beam RF Ion Source for Thin Film Growth
尤大伟; 黄小刚; 任荆学; 李安杰; 北京8701信箱
Department空间科学技术研究室
Source Publication真空科学与技术学报
2004
Volume24Issue:6Pages:451-454
ISSN1672-7126
Language中文
Keyword宽束 离子源 薄膜制备 光学薄膜 离子束 感应线圈 匹配 射频 镀膜 高性能
Abstract采用射频宽束离子源进行离子束辅助镀膜可以获得高性能的光学薄膜,已越来越得到人们的共识。本文对射频感应线圈的匹配、起弧及三栅离子光学的关键技术进行了重点考虑,并获得了稳定运行的高性能离子源。
Other AbstractA novel type of broad beam radio frequency (RF) ion source has been developed to grow optical films by ion beam assisted deposition.Matching of the inductive coils ,discharge property of the ion source and the 32grid optics were discussed. The lab2made RF ion source displays stable and satisfactory performance.
Indexed ByCSCD
Funding Project中国科学院空间科学与应用研究中心
Citation statistics
Document Type期刊论文
Identifierhttp://ir.nssc.ac.cn/handle/122/629
Collection空间技术部
Corresponding Author北京8701信箱
Recommended Citation
GB/T 7714
尤大伟,黄小刚,任荆学,等. 用于薄膜制备的射频宽束离子源的设计[J]. 真空科学与技术学报,2004,24(6):451-454.
APA 尤大伟,黄小刚,任荆学,李安杰,&北京8701信箱.(2004).用于薄膜制备的射频宽束离子源的设计.真空科学与技术学报,24(6),451-454.
MLA 尤大伟,et al."用于薄膜制备的射频宽束离子源的设计".真空科学与技术学报 24.6(2004):451-454.
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